GGNS Genus (MM)

Genus Advances ALD to 45 nm Technology Node and Beyond in Most Advanced University R&D Facility in the World Albany NanoTech Orders 300 mm Wafer ALD Systems for Advanced Dielectric and EUV Programs SUNNYVALE, Calif., Oct. 27 /PRNewswire-FirstCall/ -- Genus, Inc. , a leader in advanced thin film deposition equipment used to manufacture semiconductor and data storage devices, today announced orders for two atomic layer deposition (ALD) systems from Albany NanoTech (ANT) of the University at Albany-SUNY (UAlbany) for its 45 nm research and development (R&D) activities. The systems will be located at ANT's NanoFab 300 complex, the most advanced 300 mm wafer R&D facility at any university in the world. Albany has earmarked a Genus StrataGem300 bridge tool for its advanced dielectric research program and a StrataGem200 for use in its extreme ultraviolet (EUV) lithography program. Genus' Stratagem 200 and 300 mm systems span three generations of manufacturing, providing unique extendibility and flexibility benefits for customers worldwide. The tools' multi-film capability and extendibility from 130 nm down to 45 nm provide Albany with key benefits for use in an advanced R&D environment. "We are delighted to be selected by Albany NanoTech for both its advanced high-k dielectric and lithography EUV programs," said Bill Elder chairman and CEO of Genus, Inc. "It is a significant milestone in Genus' ALD program to be accepted at the most notable and best-funded university program in the United States." "The selection of the Genus StrataGem300 tool platforms is a critical enabling step in our strategic plan to establish a center of excellence in atomic layer deposition to address our high-end device fabrication and integration needs," stated Alain E. Kaloyeros, Ph.D., executive director of ANT and founding Dean of the School. "We are extremely excited by our partnership with Genus, given its recognition as world's leading supplier of ALD equipment. The StrataGem300 platforms will significantly strengthen our research, educational, and workforce training programs, not to mention the ability to better serve key sectors of our industrial customer base." About Albany NanoTech Albany NanoTech at UAlbany as the umbrella organization that oversees and coordinates UAlbany's comprehensive portfolio of research, education, and outreach programs in nanosciences, nanoengineering, and nanotechnology. It serves as a fully-integrated research, development, prototyping, and technology deployment resource that manages a strategic portfolio of focus centers that encompass nanoelectronics, system-on-a-chip technologies, biochips, optoelectronics and photonics devices, closed-loop sensors for monitoring, detection, and protection, and ultra-high-speed communication components. Albany NanoTech is housed in new 425,000 sq. ft. complex, including the only 200mm/300mm wafer facilities in the academic world. By mid 2004, Albany NanoTech assets will exceed $1.0B in state-of-the-art equipment and tools, housed within 60,000 sq. ft. of Class 1 capable 300mm wafer cleanrooms. These assets are dedicated to providing company partners with a unique environment to pioneer, develop, and test new ideas within a technically aggressive and financially competitive R&D environment. About Genus Genus, Inc. manufactures critical deposition processing products for the global semiconductor industry and the data storage industry. To enable the production of intricate micro-computer chips and electronic storage devices, Genus offers its LYNX and StrataGem series of production-proven equipment for 200 mm and 300 mm semiconductor production, and offers thin film deposition products for chemical vapor deposition (CVD), atomic layer deposition (ALD), and pre-clean capabilities. Genus is at the forefront of market and technology developments in the ALD marketplace, which is gaining acceptance worldwide as a critical technology for sub-0.13-micron production of computer chips and electronic storage devices. Genus' customers include semiconductor manufacturers located throughout the United States, Europe and the Pacific Rim including Korea, Japan and Taiwan. Founded in 1981, the company is headquartered in Sunnyvale, California. For additional information visit Genus' web site at http://www.genus.com/. NOTE: LYNX2(R), and LYNX3(TM) are trademarks of Genus, Inc. Forward-Looking Statements This press release contains forward-looking statements regarding the company's future financial and business performance. These forward-looking statements are subject to a number of risks and uncertainties. These contingencies include but are not limited to: actual customer orders received by the company, the extent to which ALD technology is demanded by the marketplace, the actual number of customer orders received by the company, availability of components from suppliers, the timing of final acceptance of products by customers, the financial climate, accessibility to financing and fulfillment of closing conditions, general conditions in the thin film equipment market and in the macro-economy, and the influence of global political events. Genus assumes no obligation to update this information. Additional risks and uncertainties are discussed in the Management's Discussion and Analysis of Results of Operations contained in Genus' Annual Report on Form 10-K for the fiscal year ended December 31, 2001 and subsequent quarterly reports on Form 10-Q filed with the Securities and Exchange Commission. DATASOURCE: Genus, Inc. CONTACT: Trine Pierik of Positio Public Relations, Inc., +1-650-815-1006, or , for Genus; or Irene Dunlop of Genus, Inc., +1-408-747-7140, ext. 1140; or Alain E. Kaloyeros, Ph.D., of Albany NanoTech, +1-518-442 4533, or Web site: http://www.genus.com/

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