Intel and ASML strengthen their collaboration to drive High-NA into manufacturing in 2025
January 19 2022 - 1:02AM
Intel and ASML strengthen their collaboration
to drive High-NA into manufacturing in 2025Intel
makes its first purchase order for ASML’s TWINSCAN EXE:5200 system,
marking the next step on the path to EUV 0.55 NA (High-NA)
introduction.
VELDHOVEN,
the Netherlands
and HILLSBORO, OR,
USA,
Jan.
19, 2022 –
Today, ASML Holding N.V. (ASML) and Intel Corporation (INTC)
announced the latest phase of their longstanding collaboration to
advance the cutting edge of semiconductor lithography technology.
Intel has issued its first purchase order to ASML for the delivery
of the industry’s first TWINSCAN EXE:5200 system – an extreme
ultraviolet (EUV) high-volume production system with a high
numerical aperture and more than 200 wafers per hour productivity –
as part of the two companies’ long-term High-NA collaboration
framework.
“Intel’s vision and early commitment to ASML’s High-NA EUV
technology is proof of its relentless pursuit of Moore’s Law.
Compared to the current EUV systems, our innovative extended EUV
roadmap delivers continued lithographic improvements at reduced
complexity, cost, cycle time and energy that the chip industry
needs to drive affordable scaling well into the next decade,” said
ASML President and CTO Martin van den Brink.
Intel announced at its Accelerated event in July that it plans
to deploy the first High-NA technology to enable its roadmap of
transistor innovations. Intel was the first to purchase the earlier
TWINSCAN EXE:5000 system in 2018, and with the new purchase
announced today, the collaboration continues the path for Intel’s
production manufacturing with High-NA EUV beginning in 2025.
“Intel’s focus is to stay at the forefront of semiconductor
lithography technology and we’ve been building our EUV expertise
and capacity over the last year. Working closely with ASML, we will
harness High-NA EUV’s high-resolution patterning as one of the ways
we continue Moore’s Law and maintain our strong history of
progression down to the smallest of geometries,” said Dr. Ann
Kelleher, executive vice president and general manager of
Technology Development at Intel.
The EXE platform is an evolutionary step in EUV technology and
includes a novel optics design and significantly faster reticle and
wafer stages. The TWINSCAN EXE:5000 and EXE:5200 systems offer a
0.55 numerical aperture — a precision increase from previous EUV
machines with a 0.33 numerical aperture lens — to enable
higher-resolution patterning for even smaller transistor features.
The numerical aperture of the system, combined with the wavelength
used, determines the smallest printable feature.
EUV 0.55 NA has been designed to enable multiple future nodes
beginning in 2025 as the industry’s first deployment, followed by
memory technologies at similar density. At the 2021 Investor Day,
ASML shared its EUV roadmap and indicated that High-NA technology
is expected to start supporting production manufacturing in 2025.
Today's announcement is consistent with this roadmap.
ASML
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Relations contacts |
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Skip Miller +1
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Zatezalo +1 408 483 3207 |
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23 6639 |
Peter Cheang +886
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Intel
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Relations contacts |
Investor
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(510) 220 6461 |
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|
Kenji Morita: +1
(408) 3004455 |
About ASMLASML is a leading supplier to the
semiconductor industry. The company provides chipmakers with
hardware, software and services to mass produce the patterns of
integrated circuits (microchips). Together with its partners, ASML
drives the advancement of more affordable, more powerful, more
energy-efficient microchips. ASML enables groundbreaking technology
to solve some of humanity's toughest challenges, such as in
healthcare, energy use and conservation, mobility and agriculture.
ASML is a multinational company headquartered in Veldhoven, the
Netherlands, with offices across Europe, the U.S. and Asia. Every
day, ASML’s more than 32,000 employees challenge the status quo and
push technology to new limits. ASML is traded on Euronext Amsterdam
and NASDAQ under the symbol ASML. Discover ASML – our products,
technology and career opportunities – at www.asml.com.
About IntelIntel (Nasdaq: INTC) is an industry
leader, creating world-changing technology that enables global
progress and enriches lives. Inspired by Moore’s Law, we
continuously work to advance the design and manufacturing of
semiconductors to help address our customers’ greatest challenges.
By embedding intelligence in the cloud, network, edge and every
kind of computing device, we unleash the potential of data to
transform business and society for the better. To learn more about
Intel’s innovations, go to newsroom.intel.com and intel.com.
© Intel Corporation. Intel, the Intel logo and other Intel marks
are trademarks of Intel Corporation or its subsidiaries. Other
names and brands may be claimed as the property of others.
Forward-Looking StatementsThis press release
contains forward looking statements, including statements relating
to the order of a High NA system, the path to High-NA EUV
introduction, EUV roadmap and expected timing of High-NA production
manufacturing, expected features, performance and benefits of the
platform, Intel’s future technology plans and progress, and other
non-historical matters. These statements are based on current
expectations, estimates, assumptions and projections and you should
not place undue reliance on them. Forward-looking statements do not
guarantee future performance and involve risks and uncertainties.
These risks and uncertainties include risks related to production
manufacturing of High-NA systems and timing thereof, ability to
meet roadmap and performance and attributes of the tools and
platform other risks indicated in the risk factors included in
ASML’s most recent Annual Report on Form 20-F, Intel’s most recent
report on Form 10-K, and other filings made by ASML and Intel with
the US Securities and Exchange Commission, available at
www.sec.gov. These forward-looking statements are made only as of
the date of this document. We do not undertake to update or revise
the forward-looking statements, whether as a result of new
information, future events or otherwise.
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