MILPITAS, Calif., Feb. 19, 2015 /PRNewswire/ -- Today,
KLA-Tencor Corporation (NASDAQ: KLAC) introduced two advanced
metrology systems that support the development and production of
16nm and below IC devices: Archer™ 500LCM and SpectraFilm™ LD10.
The Archer 500LCM overlay metrology system provides accurate
overlay error feedback through all stages of the yield ramp,
helping chipmakers resolve overlay issues associated with
innovative patterning techniques, such as multi-patterning and
spacer pitch splitting. Through reliable, precise measurement of
film thickness and stress, the SpectraFilm LD10 films metrology
system enables qualification and monitoring of the films and film
stacks used in fabrication of FinFETs, 3D NAND and other
leading-edge devices. The new systems are key products in
KLA-Tencor's unique 5D™ patterning control solution, which drives
optimal patterning results through the characterization and
monitoring of fab-wide processes.
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"As the industry leader in non-destructive optical metrology, we
have closely collaborated with our customers to understand their
challenges in optimizing pattern overlay, critical dimensions and
films quality," stated Ahmad Khan,
group vice president of KLA-Tencor's Parametric Solutions Group.
"Across foundry, logic and memory, our customers require
production-capable metrology systems that produce the data
necessary to decipher complex process issues. Full-featured
metrology systems, such as our new Archer 500LCM and SpectraFilm
LD10 platforms, implement multiple innovations that facilitate
measurement flexibility across a broad range of applications,
helping our customers drive current-node yield and investigate
next-node technologies."
With both imaging and unique laser-based scatterometry
measurement technologies, the Archer 500LCM overlay metrology
system offers a wide range of measurement options and supports a
diverse range of overlay measurement target designs, such as
in-die, small pitch and multi-layer targets. This flexibility
enables cost-effective generation of accurate overlay error data
that can be used for scanner corrections or for identification of
inline excursions, helping engineers determine when to re-work
wafers or adjust processes to meet strict patterning requirements.
Multiple Archer 500LCM systems are in use at foundry, logic and
memory manufacturers worldwide where they provide an independent
assessment of overlay performance for advanced development and high
volume production.
The SpectraFilm LD10 introduces a laser-driven plasma light
source, producing reliable, high-precision film measurements for a
broad range of film layers, including the thin, multilayer film
stacks used in forming complex device structures such as FinFETs.
Characterization of the thick, multilayer film stacks found in 3D
NAND flash devices is enabled with a new infrared-based subsystem.
With a significant increase in throughput compared to the
previous-generation Aleris® platform, the SpectraFilm LD10
maintains high productivity while qualifying and monitoring the
increased number of film layers associated with multi-patterning
and other leading-edge fabrication techniques. Multiple SpectraFilm
LD10 orders have been placed for use in advanced IC development and
production.
The Archer 500LCM and SpectraFilm LD10 systems join the
SpectraShape™ 9000 critical dimension and device profile metrology
platform, K-T Analyzer® advanced data analysis system and many
other process control systems in supporting KLA-Tencor's
comprehensive 5D patterning control solution. To maintain the high
performance and productivity demanded by leading-edge IC
manufacturing, the Archer 500LCM and SpectraFilm LD10 systems are
backed by KLA-Tencor's global, comprehensive service network. More
information can be found on the 5D patterning control solution web
page.
About
KLA-Tencor:
KLA-Tencor Corporation, a leading provider of process control and
yield management solutions, partners with customers around the
world to develop state-of-the-art inspection and metrology
technologies. These technologies serve the semiconductor, LED and
other related nanoelectronics industries. With a portfolio of
industry-standard products and a team of world-class engineers and
scientists, the company has created superior solutions for its
customers for more than 35 years. Headquartered in Milpitas, Calif., KLA-Tencor has dedicated
customer operations and service centers around the world.
Additional information may be found at http://www.kla-tencor.com
(KLAC-P).
Forward Looking
Statements:
Statements in this press release other than historical facts, such
as statements regarding the expected performance of the Archer
500LCM and SpectraFilm LD10 systems and the 5D patterning control
solution; the extendibility of the Archer 500LCM and SpectraFilm
LD10 systems and the 5D patterning control solution to next-node
technologies; expected uses of the Archer 500LCM and SpectraFilm
LD10 systems and the 5D patterning control solution by KLA-Tencor's
customers; and the anticipated cost, operational and other benefits
realizable by users of the Archer 500LCM and SpectraFilm LD10
systems and the 5D patterning control solution, are forward-looking
statements, and are subject to the Safe Harbor provisions created
by the Private Securities Litigation Reform Act of 1995. These
forward-looking statements are based on current information and
expectations, and involve a number of risks and uncertainties.
Actual results may differ materially from those projected in such
statements due to various factors, including delays in the adoption
of new technologies (whether due to cost or performance issues or
otherwise), the introduction of competing products by other
companies or unanticipated technological challenges or limitations
that affect the implementation, performance or use of KLA-Tencor's
products.
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SOURCE KLA-Tencor Corporation