WILSONVILLE, Ore., April 6, 2015 /PRNewswire/ -- Mentor
Graphics Corp. (NASDAQ: MENT) today announced that TSMC and Mentor
Graphics have reached the first milestone of their collaboration on
10nm EDA certification. Calibre® physical verification and design
for manufacturing (DFM) platform, and the Analog FastSPICE™ (AFS™)
Circuit Verification Platform, including AFS Mega, are certified by
TSMC based on the most current version of 10nm design rules and
SPICE models. New tool feature enhancement based on 10nm
process requirements has been made in Olympus-SoC™ digital design
platform with TSMC validation, and certification of full chip
integration is actively on-going. In addition to 10nm, Mentor has
also completed 16FF+ version 1.0 certification of the Calibre,
Olympus-SoC and AFS platforms. These certifications provide
designers with the earliest access to signoff technology optimized
for TSMC's most advanced process nodes, with improved performance
and accuracy.
"The long-term partnership we have with Mentor Graphics enables
us to work closely from the earliest phases of technology
development so we can have production ready design kits and
software available for our customers concurrently with the
announcement of new process offerings," said Suk Lee, TSMC Senior Director, Design
Infrastructure Marketing Division. "Mentor's design solutions have
successfully met the accuracy and compatibility requirements for
TSMC 10nm FinFET technology, so customers can initiate their
designs with accurate verification solutions."
The Analog FastSPICE Platform provides fast circuit verification
for nanometer analog, RF, mixed-signal, memory, and custom digital
circuits. For large circuits the AFS Platform also delivers high
capacity and fast mixed-signal simulation. For embedded SRAM and
other array-based circuits, AFS Mega delivers highly accurate
simulation results.
As circuit reliability remains a focus, Mentor and TSMC have
enhanced the Calibre PERC™ product offering in 10nm to ensure that
design and IP development teams have robust verification solutions
for identifying sources of electrical error. Additionally, the
Calibre xACT™ extraction suite includes updated models to deliver
more accurate results to fulfill tighter accuracy requirements of
10nm.
For TSMC's 16FF+ 1.0 Calibre design kit release, the Calibre
team has worked with TSMC to speed up DRC performance by 30% on
average. In addition, TSMC and Mentor released new filling use
models that will improve first-pass fill runs, making ECO changes
easier and faster. The new fill methodology will also help ensure
consistent cycle times during post fill verification.
"Because Mentor and TSMC work together from the earliest stages
of design rule development for a new process node, we learn what
the new design and verification challenges are right along with
TSMC." said Joseph Sawicki, vice
president and general manager of the Design to Silicon division at
Mentor Graphics. "This gives us the ability to have the most
advanced capabilities in place for ecosystem early adopters, and to
continue to optimize performance as the new process moves to full
production status."
About Mentor Graphics
Mentor Graphics Corporation is a world leader in electronic
hardware and software design solutions, providing products,
consulting services and award-winning support for the world's most
successful electronic, semiconductor and systems companies.
Established in 1981, the company reported revenues in the last
fiscal year in excess of $1.24
billion. Corporate headquarters are located at 8005 S.W.
Boeckman Road, Wilsonville, Oregon
97070-7777. World Wide Web site: http://www.mentor.com/.
(Mentor Graphics and Calibre are registered trademarks and PERC,
xACT, Olympus-SoC, Analog FastSPICE and AFS are trademarks of
Mentor Graphics Corporation. All other company or product names are
the registered trademarks or trademarks of their respective
owners.)
For more information, please contact:
Gene Forte
Mentor Graphics
503.685.1193
gene_forte@mentor.com
Logo -
http://photos.prnewswire.com/prnh/20140317/AQ83812LOGO
To view the original version on PR Newswire,
visit:http://www.prnewswire.com/news-releases/tsmc-certifies-mentor-graphics-tools-for-early-design-start-in-tsmcs-10nm-finfet-technology-300061014.html
SOURCE Mentor Graphics