GGNS Genus (MM)

Genus Lands First ALD Customer in Taiwan Major Foundry to Adopt ALD for Advanced DRAM Production SUNNYVALE, Calif., April 1 /PRNewswire-FirstCall/ -- Genus, Inc. today announced that it received a purchase order for its StrataGem atomic layer deposition (ALD) system from one of the world's largest semiconductor foundries in Taiwan. This marks the first insertion of Genus' ALD tools into Taiwan. The system will be used for the production of advanced DRAMs of 110 nm, 90 nm, 70nm and below. Genus' StrataGem system was selected because it delivers the best in class process capabilities, smallest footprint and production reliability necessary for the manufacturing of leading-edge devices. The Genus StrataGem product offers alarge number of film processes for use in advanced semiconductor devices including DRAMs, Flash, EDRAMs, ASICs, logic and thin film heads. The key features of the StrataGem system is its patented chamber and ALD gas delivery system design. Today, DRAM capacitors are a main driver of ALD into volume manufacturing in semiconductors, and this order marks the third DRAM manufacturer to use Genus' ALD systems in volume production lines. "ALD has been named the technology of choice for DRAM capacitors, and Taiwan has been a key target growth area for Genus," states Bill Elder, chairman and CEO of Genus. "This order signals the further adoption of ALD use in mass production of advanced semiconductor devices, and we are pleased to add this key major Taiwanese customer to the growing list of ALD adopters worldwide." "Genus has already increased its support and logistics capabilities in Taiwan as we continue our expansion into the region," said John Voltz, vice president of sales and marketing for Genus. "This first purchase of our advanced StrataGem system validates our customer's confidence in our ability to deliver high quality, production worthy processes to meet their most advanced technology requirements." About Genus: Genus, Inc. manufactures critical deposition processing products for the global semiconductor industry and the data storage industry. To enable the production of intricate micro computer chips and electronic storage devices, Genus offers its StrataGem and LYNX series production-proven equipment for 200mm and 300mm semiconductor production, and offers thin film deposition products for chemical vapor deposition (CVD), atomic layer deposition (ALD), and pre-clean capabilities. Genus is at the forefront of market and technology developments in the ALD marketplace, which is gaining acceptance worldwide as a critical technology for sub 0.13-micron production of computer chips and electronic storage devices. Genus' customers include semiconductor and data storage manufacturers located throughout the United States, Europe and the Pacific Rim including Korea, Japan and Taiwan. Founded in 1981, the company is headquartered in Sunnyvale, California. For additional information visit Genus' web site at http://www.genus.com/. LYNX2(R) and LYNX3(TM) are trademarks of Genus, Inc. DATASOURCE: Genus, Inc CONTACT: Trine Pierik of Positio Public Relations, Inc., +1-408-453-2400 or , for Genus, Inc.; or Shum Mukherjee of Genus, Inc., +1-408-747-7140 or Web site: http://www.genus.com/

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