Advantest Launches F3000 EB Lithography System Supports 300mm, 65nm & Below Process Technology

Date : 10/26/2006 @ 1:30AM
Source : PR Newswire
Stock : Advantest (Kab) Ads (ATE)
Quote : 22.74  -0.69 (-2.94%) @ 5:32PM
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Advantest Launches F3000 EB Lithography System Supports 300mm, 65nm & Below Process Technology

TOKYO, Oct. 26 /PRNewswire-FirstCall/ -- Advantest Corporation (NYSE:ATE)(TSE:6857), today announced the availability of its new F3000 electron beam (EB) lithography system, which supports 300 mm wafer process technology and 65 nm rule devices -- and smaller.

In recent years, the system LSIs that drive high-functionality, high- performance consumer electronics such as digital televisions and DVD recorders have continued to diversify, while generation succeeds generation at an accelerating rate. As chip-makers shift to high-mix, variable-volume production, they also face increasing market pressure to fill orders faster by reducing manufacturing times. However, the mainstream optical lithography method of writing circuits onto wafers confronts LSI developers with several obstacles to increased efficiency. Among the most serious are the soaring costs of masks, resulting from miniaturization, and the increasing times necessary to manufacture them.

Advantest has now developed a maskless lithography system that employs electron beam direct writing (EBDW) technologies to draw 65 nm circuits, and smaller, on 300 mm wafers: the F3000. Utilizing Advantest's expertise in high- resolution electron optical technology, and the company's capacity to deliver reliability and high operation rates, with a more rigid body and other improvements in every aspect of its construction, the F3000 achieves an approximately 20% improvement over Advantest's previous model in image placement accuracy and critical dimension control -- two of the main challenges resulting from pattern miniaturization.

Key Specifications Supported Wafer Size 300mm Minimum Line Width Less than or equal to 40nm Dimensional Accuracy Less than or equal to 7nm Overlay Accuracy Less than or equal to 20nm Drawing Method Block exposure system Maximum # of Blocks Selectable: 100 Block Magnification 60x

Note: All information supplied in this release is correct at the time of publication, but may be subject to change without warning.

About Advantest

Advantest Corporation is the world's leading automatic test equipment supplier to the semiconductor industry, and also produces electronic and optoelectronic instruments and systems. A global company, Advantest has long offered total ATE solutions, and serves the industry in every component of semiconductor test: tester, handler, mechanical and electrical interfaces, and software. Its logic, memory, mixed-signal and RF testers and device handlers are integrated into the most advanced semiconductor production lines in the world. Founded in Tokyo in 1954, Advantest established its first subsidiary in 1982, in the USA, and now has 43 subsidiaries worldwide. Among them, Advantest America, Inc. is based in Santa Clara, CA., and Advantest (Europe) GmBH is based in Munich, Germany. More information is available at http://www.advantest.co.jp/

DATASOURCE: Advantest

CONTACT: Amy Gold for Advantest, +1-212-850-6670

Web site: http://www.advantest.com/

http://www.advantest.co.jp/

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