By Ben Zwirs
AMSTERDAM--Dutch semiconductor equipment maker ASML Holding NV
(ASML) confirmed reports that one of its extreme ultraviolet, or
EUV, lithography machines reached a throughput of 637 wafers per
day, ahead of the target of 500 wafers it gave in its second
quarter earnings report.
"Our engineers were present at the IBM site," when the machine
processed 637 wafers in 24 hours, Niclas Mika, a spokesman for ASML
said Wednesday. He declined to comment if other customers were also
able to reach similar performance with ASML's EUV system.
In its second quarter earnings report two weeks ago ASML said it
was on track to reach the targeted 500 wafers per day around the
end of the year. By 2016 the company aims to process 1,500 wafers
per day.
EUV is the next generation of lithography systems needed for the
continuation of Moore's Law, which says the amount of transistors
that could be fitted on a chip of a given size at an acceptable
cost doubles every two years.
Write to Ben Zwirs at ben.zwirs@wsj.com
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