MILPITAS, Calif., Aug. 16, 2016 /PRNewswire/ -- Today,
KLA-Tencor Corporation (NASDAQ: KLAC) introduced three advanced
reticle inspection systems that address 10nm and below mask
technologies: the Teron™ 640, Teron™ SL655 and Reticle Decision
Center (RDC). All three systems are key to enabling both current
and next-generation mask designs, so that mask shops and IC fabs
can more efficiently identify lithographically significant and
severe yield-damaging defects.
Utilizing innovative Dual Imaging technology, the Teron 640
inspection system offers the sensitivity necessary for mask shops
to accurately qualify advanced optical masks. The Teron SL655
inspection system introduces new STARlightGold™ technology,
helping IC manufacturers assess incoming reticle quality, monitor
reticle degradation and detect yield-critical reticle defects. The
comprehensive reticle quality measurements produced by the Teron
inspectors are supported by RDC, a data analysis and management
system that provides a wide array of capabilities that drive
automated defect disposition decisions, improve cycle time and
reduce the reticle-related patterning errors that can affect
yield.
"Today's complex patterning techniques, such as spacer assist
quadruple patterning (SAQP), utilize increasingly complex masks,
making it crucial to qualify and maintain the reticle state to
achieve optimal wafer patterning," stated Yalin Xiong, Ph.D., vice president and general
manager of the Reticle Products Division (RAPID) at KLA-Tencor.
"Our team has developed state-of-the-art reticle inspection and
data analysis technologies that address both current and
next-generation mask designs. By tying the rich datasets generated
by the Teron 640 and Teron SL655 to RDC's evaluation capabilities,
mask shops and IC fabs can more efficiently identify
lithographically significant reticle defects, thereby improving
mask quality control and obtaining better production
patterning."
Built on the industry-leading Teron reticle inspection platform
for mask shops, the Teron 640 supports inspection of advanced
optical masks through the utilization of 193nm illumination with
Dual Imaging mode—a combination of high resolution inspection and
aerial imaging with printability-based defect dispositioning.
Additionally, the Teron 640 includes enhancements to advanced
die-to-database inspection algorithms to further maximize defect
sensitivity as well as a new higher throughput option to decrease
time to results. Multiple Teron 640 reticle inspection systems have
been installed at foundry and logic manufacturers where they are
being used for high-performance reticle quality control.
The Teron SL655's core technology, STARlightGold,
generates a golden reference from the mask at incoming quality
check and then uses this reference for mask re-qualification
inspections. The unique technology enables full-field reticle
coverage and maximizes the detection of defects, such as haze
growth or contamination, on a full range of mask types, including
those that utilize highly complicated optical proximity techniques.
The Teron SL655's industry-leading production throughput supports
the fast cycle times required to qualify the increased number of
reticles associated with advanced multi-patterning techniques. In
addition, the Teron SL655 is EUV-compatible, allowing collaboration
with IC manufacturers on in-fab EUV reticle inspection
requirements. Teron SL655 systems are under evaluation with IC
manufacturers for incoming reticle quality control and reticle
re-qualification during chip production.
RDC is a comprehensive data analysis and storage platform that
supports multiple KLA-Tencor reticle inspection and metrology
platforms for mask shops and IC fabs. RDC provides several
applications including Automatic Defect Classification (ADC), which
runs concurrently with the inspection station, and Lithography
Plane Review (LPR), which analyzes the printability of defects
detected by reticle inspectors. These applications automate defect
disposition decisions, resulting in improved cycle time and
reduction in critical errors. RDC has been adopted by multiple
foundry and memory manufacturers for data management and analysis
during mask qualification.
The Teron 640, Teron SL655 and RDC join the LMS IPRO6 reticle
pattern placement metrology system and K-T Analyzer® advanced data
analysis system in providing a comprehensive reticle qualification
solution for advanced mask and IC manufacturers. The Teron 640,
Teron SL655 and RDC are also critical components in KLA-Tencor's 5D
Patterning Control Solution™, which helps IC manufacturers obtain
better patterning performance through process monitoring and
control throughout the fab and mask shop. To maintain the high
performance and productivity demanded by leading-edge mask and IC
manufacturing, the Teron 640, Teron SL655 and RDC are backed by
KLA-Tencor's global comprehensive service network. More information
can be found on the 5D Patterning Control Solution web page.
About KLA-Tencor:
KLA-Tencor Corporation (NASDAQ:
KLAC), a leading provider of process control and yield management
solutions, partners with customers around the world to develop
state-of-the-art inspection and metrology technologies. These
technologies serve the semiconductor, LED, and other related
nanoelectronics industries. With a portfolio of industry-standard
products and a team of world-class engineers and scientists, the
company has created superior solutions for its customers for 40
years. Headquartered in Milpitas,
Calif., KLA-Tencor has dedicated customer operations and
service centers around the world. Additional information may be
found at http://www.kla-tencor.com (KLAC-P).
Forward Looking Statements:
Statements in this press
release other than historical facts, such as statements regarding
the expected performance of the Teron 640 and Teron SL655 reticle
inspection systems and the Reticle Decision Center; the
extendibility of the Teron 640 and Teron SL655 reticle inspection
systems and Reticle Decision Center to future technology nodes;
trends in the semiconductor industry and the anticipated challenges
associated with them; expected uses of the Teron 640 and Teron
SL655 reticle inspection systems and Reticle Decision Center by
KLA-Tencor's customers; and the anticipated cost, operational and
other benefits realizable by users of the Teron 640 and Teron SL655
reticle inspection systems and Reticle Decision Center, are
forward-looking statements, and are subject to the Safe Harbor
provisions created by the Private Securities Litigation Reform Act
of 1995. These forward-looking statements are based on current
information and expectations, and involve a number of risks and
uncertainties. Actual results may differ materially from those
projected in such statements due to various factors, including
delays in the adoption of new technologies (whether due to cost or
performance issues or otherwise), the introduction of competing
products by other companies or unanticipated technological
challenges or limitations that affect the implementation,
performance or use of KLA-Tencor's products.
Photo - http://photos.prnewswire.com/prnh/20160811/397646
Logo - http://photos.prnewswire.com/prnh/20140123/SF50413LOGO
To view the original version on PR Newswire,
visit:http://www.prnewswire.com/news-releases/kla-tencor-announces-new-suite-of-reticle-inspection-technologies-300314221.html
SOURCE KLA-Tencor Corporation